P479 – 2″ UHV Multitech. deposition system Uni Bielefeld
Application
Multi chamber system as combination of UHV MBE system & UHV sputter deposition system for thin film and multilayer deposition at 2″ substrates
Year of delivery
2021
Installation site
University Bielefeld, Germany
Design Features
- Multitechnique deposition system consting a UHV magnetron sputter deposition system and a UHV MBE system connected to a load lock chamber.
- UHV magnetron sputter deposition system with combination of confocal and face to face sputter up configurations.
- Up to six 2″ magnetrons in confocal or face to face configuration and one 3″ magnetrons in confocal configuration.
- Three 2″ magnetrons mounted at a rotating cluster flange in face to face configuration.
- Three 2″ magnetrons and the 3″ magnetron with pneumatic in situ tilting.
- All magnetrons with easy changeable magnetic system for use with ferromagentic or non-ferromagnetic target materials.
- DC switching unit and RF switching unit (two sources connected to one generator).
- Fully motorized 3 axes sample manipulator with integrated sample shutter and maximal sample temperature well above 800°C.
- Up to six 2″ magnetrons in confocal or face to face configuration and one 3″ magnetrons in confocal configuration.
- UHV MBE system with combination of up to seven effusion cells in confocal configuration and optional e-beam source in face to face configuration.
- Hot filament effusion cells as well as dual filament effusion cells possible.
- Fully motorized 3 axes sample manipulator with integrated sample shutter and maximal sample temperature well above 800°C.
- Integrated bake out system.
- Load lock chamber with storage and lamp heating option.
Special Features
- Two types of manipulator head can be used
- Magnet head (supplied by costumer)
- Sample heating head
- Load lock chamber is prepared for adding a third deposition chamber.
- Handling of samples with electric contacts for in situ thin film diagnostic.
Outer Dimensions
Technical specifications and performance values
General
Sputtering chamber
Size
700 mm diameter, about 700 mm height
Material
stainless steel
MBE chamber
Size
400 mm diameter (340 mm cryo shroud inner diameter), about 730 mm height
Material
stainless steel
Load lock chamber
Size
200 mm diameter, about 400 mm height
Material
stainless steel
Vacuum
Sputtering chamber
Base pressure
< 3 *10-9 mbar
Pump down time
will be added soon
Chamber pumping
Turbo pumping stage, chamber lid and rotating magnetron source cluster differentially pumped by dry foreline pump
Bake out
< 150°C
MBE chamber
Base pressure
< 3 *10-10 mbar
Pump down time
will be added soon
Chamber pumping
Combined turbo pump, ion getter pump and titanium sublimation pumping stage with dry foreline pump
Bake out
< 200°C
Load lock chamber
Base pressure
< 10-8 mbar
Pump down time
will be added soon
Chamber pumping
Turbo pumping stage, chamber door differentially pumped by dry foreline pump
Manipulator features
Sputtering chamber
Sample size
diameter max. 2″ substrate
Motion axes
3 motorized axes (manipulator x, y, and z tranlsation)
Pneumatic sample shutter with motorized z-translation stage (shutter to sampe distance can be constant while moving the manipulator head)
Temperatures
Room temperature (not stabilized) up to > 950°C at sample
Special features
DC Bias possible
Use of samples with integrated electrical contacts possible
MBE chamber
Sample size
diameter max. 2″ substrate
Motion axes
3 motorized axes (manipulator x, y, and z tranlsation)
Pneumatic linear motion sample shutter mounted at fixed height to chamber wall
Temperatures
Room temperature (not stabilized) up to > 950°C at sample
Special features
DC Bias possible
Use of samples with integrated electrical contacts possible
Load lock chamber
(Sample storage)
Storage size
5 sample holders
Sample size
diameter max. 2″ substrate
Motion axes
2 manual axes (rotation, z tranlsation)
Rotation axis equipped with an air side idexer plate for easy and fast sample loading via access door or transfer rod
Sample preparation features
Load lock chamber
(Sample storage)
Thermal treatment
Room temperature up to about 200°C at sample (no temperature regulation)
Performance test results
Chamber pump down
Long time sample heating (LL)
Long time sample heating (SP)
Long time sample heating (MBE)
