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Ion beam etching systems

Ion beam etching systems are mainly used for structuring sample surfaces by moving the sample below a fine spot ion beam. Bestec develop complete systems including the complex sample motion stage.

Typical design parameters

  • Depending on user requests either fine spot ion gun, focused gridded ICP RF ion gun or focused gridded DC ion gun.
  • Multi axes sample stage.
  • Software control incl. automatic sample motion during the etching process.


  • Integration of source shutter or sample shutter.
  • Integration of mask system to define the ion beam spot size at the sample.
  • Integration of sample heating or sample cooling.

Selected Projects